NF3 is more efficient and environmentally friendly than traditional gases like sulfur hexafluoride (SF6). It can decomposes into nitrogen and fluorine, reducing greenhouse gas concerns compared to alternatives.
| Chemical Name | Property | Purity | Supply Package Parameters
(Under 21.1℃） |
|||
| Valve | Capacity (L) |
Pressure
(psig) |
Gas Volume |
|||
| Nitrogen Trifluoride | colorless, odorless gas | 99.995% | CGA330/DISS-640 | 44 | 1450 | 18kg |
Used as a cleaning gas in the manufacture of semiconductors and flat-panel displays. Essential for cleaning chemical vapor deposition (CVD) chambers.
Applied in the production of solar panels for cleaning processes
Precursor for fluorine-containing compounds
Provides a source of reactive fluorine in plasma etching for microelectronics.
